| 摘要 |
PROBLEM TO BE SOLVED: To provide plasma CVD device and plasma CVD method that can suppress occurrence of particles and facilitate maintenance.SOLUTION: A plasma CVD device has a vacuum chamber 1, a first electrode plate 5 disposed in the vacuum chamber 1, a first electrode part A having a first heater 6 as a first heating part for heating the first electrode plate 5, a second electrode plate which is provided to confront the first electrode plate 5 and also serves as a board holder 2 in which a processing target board W is mounted, a second electrode part B having a second heater 3 as a second heating part for heating the second electrode plate, and a gas supply part for supplying raw material gas into the vacuum chamber 1. High-frequency electric field is applied between the first electrode plate 5 and the second electrode plate to generate plasma discharge and form thin film on the surface of the processing target board W. |
