MULTI-STEP LOCATION SPECIFIC PROCESS FOR SUBSTRATE EDGE PROFILE CORRECTION FOR GCIB SYSTEM

摘要

Disclosed are an apparatus, system, and method for scanning a substrate or other workpiece through a gas-cluster ion beam (GCIB), or any other type of ion beam. The workpiece scanning apparatus is configured to receive and hold a substrate for irradiation by the GCIB and to scan it through the GCIB in two directions using two movements: a reciprocating fast-scan movement, and a slow-scan movement. The slow-scan movement is actuated using a servo motor and a belt drive system, the belt drive system being configured to reduce the failure rate of the workpiece scanning apparatus.

主权项

1. A method for scanning a workpiece through a charged particle beam, comprising:
mounting a workpiece on a scanning system arranged to scan the workpiece through a charged particle beam; performing a first scanning motion of the workpiece through the charged particle beam along a circular path that begins and ends in substantially the same location on the workpiece; and performing a second scanning of the workpiece through the charged particle beam along a non-circular path that begins and ends in substantially different locations on the workpiece.