发明名称 LUMINAIRES AND REFLECTOR MODULES
摘要 A luminaire and reflector module for the luminaire are disclosed wherein the reflector has a base plate defining a plurality of reflector light source apertures and a plurality of reflectors extending integrally and individually from the base plate adjacent to the light source apertures.
申请公布号 US2015345741(A1) 申请公布日期 2015.12.03
申请号 US201414288512 申请日期 2014.05.28
申请人 LSI Industries, Inc. 发明人 Sferra James P.;Boyer John D.;Vanden Eynden James G.;Akers Larry A.;Orth Brian J.
分类号 F21V7/00 主分类号 F21V7/00
代理机构 代理人
主权项 1. A luminaire comprising: a first row of light sources extending in the X-direction of the luminaire and comprising a first light source and a second light source; a second row of light sources extending in the X-direction of the luminaire and comprising a third light source and a fourth light source, the second row of light sources displaced in the Y-direction from the first row of light sources; a reflector module, the reflector module comprising: a base plate, the base plate defining a first light source aperture associated with the first light source, a second light source aperture associated with the second light source, and a first reflector aperture between the first light source aperture and the second light source aperture, the first reflector aperture defining a perimeter;a first light source forward reflector integrally extending from the reflector aperture perimeter adjacent the first light source aperture, the first light source forward reflector comprised of material displaced from the base plate to define the first reflector aperture;a second light source rear reflector integrally extending from the reflector aperture perimeter adjacent the second light source aperture, the second light source rear reflector comprised of material displaced from the base plate to define the first reflector aperture;a third light source aperture defined in the base plate and associated with the third light source, a fourth light source aperture defined in the base plate and associated with the fourth light source, and a second reflector aperture defined in the base plate between the third light source aperture and the fourth light source aperture, the second reflector aperture defining a perimeter;a third light source forward reflector integrally extending from the second reflector aperture perimeter adjacent the third light source aperture, the third light source forward reflector comprised of material displaced from the base plate to define the second reflector aperture; anda fourth light source rear reflector integrally extending from the second reflector aperture perimeter adjacent the fourth light source aperture, the fourth light source rear reflector comprised of material displaced from the base plate to define the second reflector aperture;wherein the first light source forward reflector, the second light source rear reflector, the third light source forward reflector, the fourth light source rear reflector are each individual reflectors.
地址 Cincinnati OH US