PULSED PLASMA DEPOSITION DEVICE

摘要

A pulsed plasma deposition device, including an apparatus for generating a beam of electrons, a target and a substrate, the apparatus being suitable for generating a pulsed beam of electrons directed towards said target to determine the ablation of the material of said target in the form of a plasma plume directed towards said substrate. The device includes a transportation and focussing group of the beam of electrons towards said target, arranged between said apparatus and said target and including a transportation cone, the transportation and focussing group also including a focussing electrode directly connected to the transportation cone and shaped substantially like a loop. The axis of symmetry of the focussing electrode is perpendicular, or substantially perpendicular, to the surface of the target.

主权项

1. A pulsed plasma deposition device, comprising:
an apparatus for generating a beam of electrons; a target and a substrate, said apparatus being suitable for generating a pulsed beam of electrons directed towards said target to determine the ablation of the material of said target in the form of a plasma plume directed towards said substrate, said device comprising a transportation and focussing group of the beam of electrons towards said target, arranged between said apparatus and said target and comprising a transportation cone, said transportation and focussing group also comprising a focussing electrode directly connected to said transportation cone and shaped substantially in a loop, the axis of symmetry of said focussing electrode is being perpendicular, or substantially perpendicular, to the surface of the target.