| 发明名称 |
POLISHING SOLUTION FOR METAL FILMS, AND POLISHING METHOD USING SAME |
| 摘要 |
This polishing solution for metal films includes: a methacrylic-acid-based polymer having a weight average molecular weight of at least 20,000; polishing particles; and an aqueous solvent. |
| 申请公布号 |
WO2015178476(A1) |
申请公布日期 |
2015.11.26 |
| 申请号 |
WO2015JP64723 |
申请日期 |
2015.05.22 |
| 申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
HANANO MASAYUKI;MISHIMA KOUJI;FUKASAWA MASATO;SAKURAI HARUAKI |
| 分类号 |
C09K3/14;B24B37/00;C09G1/02;H01L21/304 |
主分类号 |
C09K3/14 |
| 代理机构 |
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