发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device and a manufacturing method of the same, which can reduce labor hour and increase an integration degree.SOLUTION: A semiconductor device manufacturing method comprises: a process of forming a first insulation film on one side of a first substrate; a process of forming at least one first opening and a plurality of second openings; a process of mounting a first semiconductor chip on one surface of the first substrate and in the first opening; a process of supplying a plurality of first solder balls in the plurality of second openings; a process of fusing the plurality of first solder balls to form a plurality of first conductor parts in the plurality of second openings; and a process of mounting a plurality of second solder balls connected with the plurality of first conductor parts on the first insulation film to form a plurality of first external electrodes.
申请公布号 JP2015211059(A) 申请公布日期 2015.11.24
申请号 JP20140089850 申请日期 2014.04.24
申请人 MICRON TECHNOLOGY INC 发明人 TAKESHIMA HIDEHIRO
分类号 H01L23/12;H01L25/065;H01L25/07;H01L25/18 主分类号 H01L23/12
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