发明名称 METHOD AND SYSTEM TO IMPROVE DRYING OF FLEXIBLE NANO-STRUCTURES
摘要 Disclosed herein are methods and systems for processing of nano-structures. In particular, disclosed herein are methods for processing nano-structures during semiconductor manufacturing, including nano-structures of drying high-aspect ratios. Also disclosed are systems for implementing the methods disclosed herein.
申请公布号 WO2015175521(A1) 申请公布日期 2015.11.19
申请号 WO2015US30354 申请日期 2015.05.12
申请人 TOKYO ELECTRON LIMITED;TOKYO ELECTRON U.S. HOLDINGS, INC. 发明人 PRINTZ, WALLACE P.
分类号 H01L21/3213 主分类号 H01L21/3213
代理机构 代理人
主权项
地址