发明名称 半導体装置の作製方法
摘要 A semiconductor device includes a pixel portion having a first thin film transistor and a driver circuit having a second thin film transistor. Each of the first thin film transistor and the second thin film transistor includes a gate electrode layer, a gate insulating layer, a semiconductor layer, a source electrode layer, and a drain electrode layer. Each of the layers of the first thin film transistor has a light-transmitting property. Materials of the gate electrode layer, the source electrode layer and the drain electrode layer of the first thin film transistor are different from those of the second transistor, and each of the resistances of the second thin film transistor is lower than that of the first thin film transistor.
申请公布号 JP5814418(B2) 申请公布日期 2015.11.17
申请号 JP20140088247 申请日期 2014.04.22
申请人 株式会社半導体エネルギー研究所 发明人 木村 肇;大原 宏樹;鹿山 昌代
分类号 H01L21/336;G02F1/1368;G09F9/00;G09F9/30;H01L21/28;H01L29/417;H01L29/423;H01L29/49;H01L29/786;H01L51/50;H05B33/14 主分类号 H01L21/336
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