| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology capable of improving cleanliness of an atmosphere by removing particles 100 in the atmosphere within equipment to be used for a semiconductor manufacturing step of a coating or development apparatus or a carrier container, and further improving work efficiency in the removal of the particles 100.SOLUTION: A substrate 10 can be conveyed by a substrate carrying mechanism to be used for the equipment used for the semiconductor manufacturing step of the coating or development apparatus or the carrier container and can be placed in a processing module. At one surface side of the substrate 10, a space is formed that is partitioned with respect to the atmosphere by a partition member 2, a piezoelectric blower 3 is provided within the space, and a filter part 4 is formed in a portion of the partition member 2, such that a dust collection substrate 1 is configured. The dust collection substrate 1 is carried within the coating or development apparatus by the carrying mechanism, and an air current of the atmosphere within a carrier path or the processing module is circulated in the partitioned space and passed through the filter part 4. Thus, the particles 100 contained in the atmosphere within the coating or development apparatus are collected by the filter part 4. |
