SUBSTRATE SUPPORTING APPARATUS

摘要

A substrate supporting apparatus includes a rotatable chuck, a first mass flow controller, a second mass flow controller, a plurality of locating pins and guiding pillars, and a motor in which the rotatable chuck defines a plurality of first injecting ports and second injecting ports, the first injecting ports are connected with a first gas passage for supplying gas to the substrate and sucking the substrate by Bernoulli effect, the second injecting ports are connected with a second gas passage for supplying gas to the substrate and lifting the substrate, the first and the second mass flow controllers are respectively installed on the first and the second gas passages, the plurality of locating pins and guiding pillars are disposed at the top surface of the rotatable chuck and every guiding pillar protrudes to form a holding portion, and the motor is used for rotating the rotatable chuck.

主权项

1. A substrate supporting apparatus, comprising:
a rotatable chuck for supporting a substrate, defining a plurality of first injecting ports and second injecting ports, the first injecting ports connecting with a first gas passage for supplying gas to the substrate and sucking the substrate by Bernoulli effect, the second injecting ports connecting with a second gas passage for supplying gas to the substrate and lifting the substrate; a first mass flow controller installed on the first gas passage for controlling the flow of the gas supplied to the first injecting ports; a second mass flow controller installed on the second gas passage for controlling the flow of the gas supplied to the second injecting ports; a plurality of locating pins disposed at the top surface of the rotatable chuck for preventing the substrate horizontal movement when the substrate has a predefined process; a plurality of guiding pillars disposed at the top surface of the rotatable chuck, every guiding pillar protruding to form a holding portion for holding the substrate; and a motor for rotating the rotatable chuck.