发明名称 CIGS SEMICONDUCTOR LAYER, METHOD FOR MANUFACTURING SAME, AND CIGS PHOTOELECTRIC CONVERSION DEVICE IN WHICH SAID METHOD IS USED
摘要 In order to provide a CIGS semiconductor layer, a method for manufacturing the same, and a CIGS photoelectric conversion device in which the method is used, said layer making it possible to achieve high photoelectric conversion efficiency by being used in the CIGS photoelectric conversion device, a CIGS semiconductor layer (3) has Cu, In, Ga, and Se, wherein the CIGS semiconductor layer (3) further contains Na and Bi, and is configured such that the Bi concentration is 5×1018 atom/cm3-1×1019 atom/cm3 and the Na concentration is 1×1016 atom/cm3-5×1018 atom/cm3.
申请公布号 WO2015166669(A1) 申请公布日期 2015.11.05
申请号 WO2015JP51321 申请日期 2015.01.20
申请人 NITTO DENKO CORPORATION 发明人 SUGITA YOSHITAKA;WATANABE TAICHI;TERAJI SEIKI;KAWAMURA KAZUNORI;NISHII HIROTO;KURATA TOMOHIRO;MINEMOTO TAKASHI;CHANTANA JAKAPAN
分类号 H01L31/0749;C23C14/06;C23C14/58;H01L21/363;H01L31/0256;H01L31/18 主分类号 H01L31/0749
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