| 摘要 |
The present invention provides an imprint apparatus which forms a pattern in an imprint material supplied onto a substrate using a mold, the apparatus comprising a supply unit including a plurality of orifices each of which discharges the imprint material toward the substrate and configured to supply the imprint material onto the substrate by discharge of the imprint material from each orifice, and a control unit configured to control the discharge of the imprint material from each orifice in accordance with distribution information indicating a distribution, on the substrate, of the imprint material that should be supplied onto the substrate, wherein the control unit updates, based on information on a discharge amount of the imprint material discharged from each orifice, the distribution information such that a thickness of the imprint material formed using the mold falls within an allowable range. |
