| 主权项 |
1. A positive photosensitive resin composition comprising:
(A) a resin precursor comprising a polybenzoxazole precursor, a polyamic acid, or a combination thereof; (B) about 0.1 to about 20 parts by weight of a dissolution-controlling agent having a boiling point ranging from 210° C. to about 400° C. and a polarity ranging from about 1 D to about 4 D; (C) about 1 to about 50 parts by weight of an acid generator; (D) about 0.1 to about 30 parts by weight of a silane-based compound; and (E) about 100 to about 400 parts by weight of a solvent, based on about 100 parts by weight of the resin precursor (A), wherein the polybenzoxazole precursor comprises a repeating unit represented by the following Chemical Formula 1 or both of repeating units represented by the following Chemical Formulae 1 and 2 and a thermally polymerizable functional group derived from a monoamine having a double bond, a monoanhydride having a double bond, or a mixture thereof at at least one end, and the polyamic acid comprises a repeating unit represented by the following Chemical Formulae 50 and 51: wherein, in Chemical Formulae 1 and 2, X1 comprises an aromatic organic group or a quadrivalent to hexavalent aliphatic organic group, Y1 and Y2 are the same or different and independently comprise an aromatic organic group or a divalent to hexavalent aliphatic organic group, and X2 comprises an aromatic organic group, a divalent to hexavalent aliphatic organic group, a divalent to hexavalent alicyclic organic group, or an organic group represented by the following Chemical Formula 3, wherein, in Chemical Formula 3, R5 to R8 are the same or different and independently comprise substituted or unsubstituted alkyl, substituted or unsubstituted aryl, substituted or unsubstituted alkoxy, or hydroxy, R9 and R10 are the same or different and independently comprises substituted or unsubstituted alkylene or substituted or unsubstituted arylene, and k is an integer ranging from 1 to 50, wherein, in Chemical Formulae 50 and 51, X3 comprises an aromatic organic group or a divalent to hexavalent alicyclic organic group, Y3 and Y4 are the same or different and independently comprises an aromatic organic group or a quadrivalent to hexavalent alicyclic organic group, X4 comprises an aromatic organic group, a divalent to hexavalent alicyclic organic group, or a functional group represented by Chemical Formula 3, and R100 to R103 are the same or different and independently comprise hydrogen or substituted or unsubstituted C1 to C20 alkyl, wherein the dissolution-controlling agent comprises a compound of Chemical Formula 18: wherein, in Chemical Formula 18, R202 is cyclohexyl, and p″ is 1; or the dissolution-controlling agent comprises a combination of a compound of Chemical Formula 17 and a compound of Chemical Formula 18′: wherein, in Chemical Formulae 17 and 18′, R200 to R202 are the same or different and independently comprise hydrogen, substituted or unsubstituted alkyl, or substituted or unsubstituted allyl, p, p′, and p″ are the same or different and are independently an integer ranging from 1 to 4, and Z comprises O, CO, CONH, CR203R204, S, SO2, or a single bond, wherein R203 and R204 are the same or different and independently comprise hydrogen or substituted or unsubstituted alkyl, and wherein the solvent comprises gamma-butyrolactone, N,N-dimethyl acetamide, dimethyl sulfoxide, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dibutyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, methyl lactate, ethyl lactate, butyl lactate, methyl-1,3-butylene glycol acetate, 1,3-butylene glycol-3-monomethyl ether, methyl pyruvate, ethyl pyruvate, methyl-3-methoxy propionate, or a mixture thereof. |
