METHODS OF PATTERNING AND MAKING MASKS FOR THREE-DIMENSIONAL SUBSTRATES

摘要

The present invention provides a method of making a mask for patterning a three-dimensional substrate. A mandrel includes a form machined in a surface corresponding to a shape of the substrate. A layer of material is deposited in a first region of the form and a metal layer is deposited in a second region of the form. A portion of the mandrel is subsequently removed. The present invention also provides a method of patterning a three-dimensional substrate with a mask.

主权项

1. A method of making a mask for patterning a three-dimensional substrate comprising:
providing a mandrel including a form machined in a surface thereof corresponding to a shape of said three-dimensional substrate; depositing a plating layer in a first region of said form; depositing a metal layer in a second region of said form, wherein said second region is different from said first region; and removing a portion of said mandrel below said plating layer in said first region and said metal layer in said second region.