发明名称 |
Method for forming an aluminosilicate-zeolite layer on a metal substrate, the coated substrate and the use thereof |
摘要 |
A method is described for forming an aluminosilicate-zeolite layer on an aluminum-containing substrate by in situ direct crystallization. Aluminum-rich aluminosilicate-zeolite coatings on aluminum-containing metal substrates obtained by this method are advantageous, for example, in sorption-based fields of application, such as heterogeneous catalysis, in separation and cleaning processes, in sorption heat pumps, in conjunction with immobilized catalysts and in microreaction technology. |
申请公布号 |
US9169563(B2) |
申请公布日期 |
2015.10.27 |
申请号 |
US201013254057 |
申请日期 |
2010.03.01 |
申请人 |
Sortech AG |
发明人 |
Herrmann Ralph;Schwieger Wilhelm;Bauer Jurgen |
分类号 |
C23C18/00;B01J20/18;C23C18/12;B01J20/16;B01J20/32;B01J29/06;B01J37/08;C23C22/66 |
主分类号 |
C23C18/00 |
代理机构 |
Morgan, Lewis & Bockius, LLP |
代理人 |
Morgan, Lewis & Bockius, LLP |
主权项 |
1. A method for forming an aluminosilicate-zeolite layer on an aluminium-containing metal substrate comprising the steps of:
transferring the aluminium-containing metal substrate into an aqueous reaction dispersion containing a silicon source and an aluminium source as network-forming elements, wherein, a molar substoichiometric ratio of the aluminium source in the aqueous reaction dispersion to the sum of the silicon source and aluminum source as network-forming elements contained in the aqueous reaction dispersion ranges from 0.02 to about 0.4, heating the aqueous reaction dispersion containing the aluminium-containing metal substrate to thereby extract aluminium from the aluminium-containing metal substrate, and performing in situ direct crystallization to thereby form a layer of an aluminium-rich aluminosilicate-zeolite directly onto the aluminium-containing metal substrate, said layer of an aluminium-rich aluminosilicate-zeolite having an Si/Al ratio of less than 5 wherein the aqueous reaction dispersion contains the silicon source in an amount sufficient for forming the Si/Al ratio of less than 5, and the aluminum source in an amount to satisfy the molar substoichiometric ratio, wherein the pH value of the aqueous reaction dispersion is alkalinized. |
地址 |
Halle (Saale) DE |