发明名称 Method for producing protective layers containing silicides and/or oxidized silicides on substrates
摘要 The invention relates to a method for producing protective layers containing silicides and/or oxidized silicides on a substrate, in which silicide or a precursor thereof is applied to the substrate and the coated substrate is subjected to a temperature treatment above 250° C. without further processing. The layers obtained have a thickness in the nano-range and can simultaneously have various characteristic features, i.e. they are multifunctional. The following characteristic features were found for these nanolayers: scratch resistance, abrasion resistance, corrosion resistance and temperature resistance up to 1500° C., depending in each case on the substrate and the silicide(oxide) used for the coating.
申请公布号 US2015299844(A1) 申请公布日期 2015.10.22
申请号 US201314415144 申请日期 2013.07.17
申请人 2h.system ;3H GmbH Raum-Management-Systeme 发明人 Kessler Hans-Jürg;Demuth Martin
分类号 C23C14/34;C23C16/44;C23C14/22;B05D3/00;C01B21/068;H01M8/02;C25B11/04;C25B11/12;C01B33/06;C01B31/36;B05D1/04;H01L31/0216 主分类号 C23C14/34
代理机构 代理人
主权项
地址 Mauren LI
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