发明名称 |
Method for producing protective layers containing silicides and/or oxidized silicides on substrates |
摘要 |
The invention relates to a method for producing protective layers containing silicides and/or oxidized silicides on a substrate, in which silicide or a precursor thereof is applied to the substrate and the coated substrate is subjected to a temperature treatment above 250° C. without further processing. The layers obtained have a thickness in the nano-range and can simultaneously have various characteristic features, i.e. they are multifunctional. The following characteristic features were found for these nanolayers: scratch resistance, abrasion resistance, corrosion resistance and temperature resistance up to 1500° C., depending in each case on the substrate and the silicide(oxide) used for the coating. |
申请公布号 |
US2015299844(A1) |
申请公布日期 |
2015.10.22 |
申请号 |
US201314415144 |
申请日期 |
2013.07.17 |
申请人 |
2h.system ;3H GmbH Raum-Management-Systeme |
发明人 |
Kessler Hans-Jürg;Demuth Martin |
分类号 |
C23C14/34;C23C16/44;C23C14/22;B05D3/00;C01B21/068;H01M8/02;C25B11/04;C25B11/12;C01B33/06;C01B31/36;B05D1/04;H01L31/0216 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
Mauren LI |