发明名称 METHOD FOR PRODUCING MICROSTRUCTURE AND PHOTOCURABLE COMPOSITION FOR NANOIMPRINTING
摘要 Provided is a method for producing a microstructure that enables continuous transfer with good mold releasability even without subjecting the mold to a surface release treatment.;The method for producing a microstructure according to the present invention includes preparing a mold having a relief-patterned surface. A substrate is separately prepared. A liquid photocurable transferable material layer is formed and sandwiched between the substrate and the mold to be shaped. The shaped transferable material layer is exposed to be converted into a photocured layer. The photocured layer is demolded from the mold to give the microstructure. The mold is prepared from a siloxane-bond-containing polymeric organic compound. The transferable material layer is formed from a photocurable composition including a cationically polymerizable compound (A) and a photoacid generator (B). The cationically polymerizable compound (A) in the photocurable composition includes at least one compound selected from the group consisting of compounds represented by Formula (I) and compounds represented by Formula (II):;
申请公布号 US2015298365(A1) 申请公布日期 2015.10.22
申请号 US201314647204 申请日期 2013.11.11
申请人 Daicel Corporation 发明人 YUKAWA Takao;MIYAKE Hiroto;MIZUTA Tomoya
分类号 B29C33/58;C08G59/02;B29C59/02 主分类号 B29C33/58
代理机构 代理人
主权项 1. A method for producing a microstructure, the method comprising the steps of: a) preparing a mold having a relief-patterned surface; b) preparing a substrate; c) forming and sandwiching a liquid photocurable transferable material layer between the substrate and the relief-patterned surface of the mold to shape the transferable material layer; d) performing exposure of the shaped transferable material layer to convert the transferable material layer into a photocured layer; and e) demolding the photocured layer from the mold to give the microstructure, the step a) comprising preparing the mold from a polymeric organic compound comprising siloxane bonds, the step c) comprising forming the transferable material layer from a photocurable composition comprising: a cationically polymerizable compound (A); anda photoacid generator (B), the cationically polymerizable compound (A) in the photocurable composition comprising at least one compound selected from the group consisting of: compounds represented by Formula (I); andcompounds represented by Formula (II):wherein n represents an integer from 0 to 10; X is, independently in each occurrence, selected from oxygen, —CH2—, —C(CH3)2—, —CBr2—, —C(CBr3)2—, —CF2—, —C(CF3)2—, —CCl2—, —C(CCl3)2—, and —CH(C6H5)—, where, when n is 2 or more, two or more occurrences of X may be identical or different; and R1 to R18 are, identically or differently, selected from hydrogen, halogen, a hydrocarbon group optionally containing oxygen or halogen, and optionally substituted alkoxy,wherein R represents a group corresponding to a q-hydric alcohol, except for removing hydroxy group in a number of q from the alcohol; and p and q each represent, identically or differently, an integer of 1 or more.
地址 Osaka-shi, Osaka JP