| 摘要 |
A substrate holder (100) for a lithographic apparatus has a planarization layer (108) provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack (200) forming an electronic component. The thin film stack comprises an (optional) isolation layer (201), a metal layer (202) forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer (203). |
