发明名称 Method of making a lithographic printing plate
摘要 A method of making a lithographic printing plate including the steps of a) image-wise exposing a lithographic printing plate precursor including a light or heat sensitive coating on a support having a hydrophilic surface or which is provided with a hydrophilic layer, and b) processing the precursor consecutively with a first solution and a second solution thereby removing the coating from the support in the non-printing areas. The first and second solutions are provided by a cascade system such that the second solution overflows into the first solution and the first solution overflows into a container to be further treated as waste, and the second solution is regenerated by adding a replenishing solution or a mixture of replenishing solutions at a rate of at least 5 ml/m2 of treated precursor and at most 30 ml/m2 of treated precursor.
申请公布号 US9156529(B2) 申请公布日期 2015.10.13
申请号 US201214342684 申请日期 2012.08.29
申请人 Agfa Graphics NV 发明人 Vervloet Ludovicus Hendrik;Sinnesael Jan;Lenaerts Jens
分类号 G03F7/00;B63B27/24;G03F7/30 主分类号 G03F7/00
代理机构 Keating & Bennett, LLP 代理人 Keating & Bennett, LLP
主权项 1. A method of making a lithographic printing plate, the method comprising the steps of: image-wise exposing a lithographic printing plate precursor including a light or heat sensitive coating on a support having a hydrophilic surface or which is provided with a hydrophilic layer; and processing the precursor consecutively with a first solution and a second solution so as to remove the coating from the support at non-printing areas; wherein the first and second solutions are provided by a cascade system such that the second solution overflows into the first solution and the first solution overflows into a container to be treated as waste; the second solution is regenerated by adding a replenishing solution or a mixture of replenishing solutions at a rate of at least 5 ml/m2 of treated precursor and at most 30 ml/m2 of treated precursor; the first and second solutions are circulated, respectively, by a first and a second liquid conveying system; the first solution present in the first liquid conveying system has a volume of at least Vmin and at most Vmax, respectively, defined by formula 1 and formula 2: Vmin=[A+(processing width/0.95 m)]·liter  (formula 1)Vmax=[B+(processing width/0.95 m)]·liter  (formula 2) Vmin and Vmax represent, respectively, a minimum and a maximum volume present in the first liquid conveying system expressed in liters; A and B represent a constant value, and A is 2 and B is 15, 10, 8, or 6; and the processing width represents a width, expressed in m, inside a processing unit, perpendicular to a processing direction of the precursor, which is available for processing plate precursors in a uniform way across their width.
地址 Mortsel BE