发明名称 |
DRIVER FOR NORMALLY ON III-NITRIDE TRANSISTORS TO GET NORMALLY-OFF FUNCTIONALITY |
摘要 |
A semiconductor device includes a depletion mode GaN FET and an integrated driver/cascode IC. The integrated driver/cascode IC includes an enhancement mode cascoded NMOS transistor which is connected in series to a source node of the GaN FET. The integrated driver/cascode IC further includes a driver circuit which conditions a gate input signal and provides a suitable digital waveform to a gate node of the cascoded NMOS transistor. The cascoded NMOS transistor and the driver circuit are formed on a same silicon substrate. |
申请公布号 |
US2015287641(A1) |
申请公布日期 |
2015.10.08 |
申请号 |
US201514745749 |
申请日期 |
2015.06.22 |
申请人 |
Texas Instruments Incorporated |
发明人 |
PENDHARKAR Sameer;TIPIRNENI Naveen |
分类号 |
H01L21/8236;H01L29/16;H01L29/20;H01L21/8234 |
主分类号 |
H01L21/8236 |
代理机构 |
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代理人 |
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主权项 |
1. A process of forming semiconductor device, comprising the steps of:
forming a depletion mode GaN FET; forming an integrated driver/cascode IC, by a process comprising the steps of:
providing a silicon substrate;forming an enhancement mode cascoded NMOS transistor in said silicon substrate; andforming a driver circuit in said silicon substrate, so that a gate node of said enhancement mode cascoded NMOS transistor is connected to said driver circuit; forming an electrical connection between a drain node of said GaN FET and a drain terminal of said semiconductor device; forming an electrical connection between a source node of said GaN FET and a drain node of said enhancement mode cascoded NMOS transistor; and forming an electrical connection between a gate terminal of said semiconductor device and said driver circuit. |
地址 |
Dallas TX US |