发明名称 |
METAL ABSORPTION GRATING AND TALBOT INTERFEROMETER |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a microstructure in which a metal microstructure with high aspect ratio can be obtained highly accurately and easily.SOLUTION: A manufacturing method of a microstructure has: a first process in which a first insulation film is formed on an Si substrate; a second process in which a part of the first insulation film is removed to expose the Si surface; a third process in which the Si substrate is etched from the exposed Si surface to form recesses; a fourth process in which a second insulation film is formed on sidewalls and bottom parts of the recesses; a fifth process in which at least a part of the second insulation film formed on the bottom parts of the recesses is removed to form an exposed surface of Si; and a sixth process in which metal is filled into the recesses from the exposed surface of Si by electrolytic plating. |
申请公布号 |
JP2015178683(A) |
申请公布日期 |
2015.10.08 |
申请号 |
JP20150133971 |
申请日期 |
2015.07.02 |
申请人 |
CANON INC |
发明人 |
WANG SHINAN;NAKAMURA TAKASHI;TEJIMA TAKAYUKI;SETOMOTO YUTAKA;WATANABE SHINICHIRO |
分类号 |
C25D1/08;G01N23/20 |
主分类号 |
C25D1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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