发明名称 METAL ABSORPTION GRATING AND TALBOT INTERFEROMETER
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a microstructure in which a metal microstructure with high aspect ratio can be obtained highly accurately and easily.SOLUTION: A manufacturing method of a microstructure has: a first process in which a first insulation film is formed on an Si substrate; a second process in which a part of the first insulation film is removed to expose the Si surface; a third process in which the Si substrate is etched from the exposed Si surface to form recesses; a fourth process in which a second insulation film is formed on sidewalls and bottom parts of the recesses; a fifth process in which at least a part of the second insulation film formed on the bottom parts of the recesses is removed to form an exposed surface of Si; and a sixth process in which metal is filled into the recesses from the exposed surface of Si by electrolytic plating.
申请公布号 JP2015178683(A) 申请公布日期 2015.10.08
申请号 JP20150133971 申请日期 2015.07.02
申请人 CANON INC 发明人 WANG SHINAN;NAKAMURA TAKASHI;TEJIMA TAKAYUKI;SETOMOTO YUTAKA;WATANABE SHINICHIRO
分类号 C25D1/08;G01N23/20 主分类号 C25D1/08
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