TARGET SUPPLY APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS, AND TARGET SUPPLY METHOD

摘要

The present invention stably supplies a target. This target supply apparatus melts a target and supplies the target to the inside of a chamber, said target generating extreme ultraviolet light when irradiated with laser light in the chamber. The target supply apparatus may be provided with: a pair of electrodes that are configured to sandwich the target by being disposed with a space therebetween; and a power supply that supplies a current to the target in a solid state via the pair of electrodes such that the inside of the solid target is melted, said target being sandwiched between the pair of electrodes.