发明名称 |
SEMICONDUCTOR DEVICE INCLUDING A VERTICAL EDGE TERMINATION STRUCTURE AND METHOD OF MANUFACTURING |
摘要 |
A semiconductor device includes a semiconductor body with a first surface at a first side, a second surface opposite to the first surface and an edge surface connecting the first and second surfaces. An edge termination structure includes a glass structure and extends along the edge surface, at least from a plane coplanar with the first surface towards the second surface. A conductive structure extends parallel to the first surface and overlaps the glass structure at the first side. |
申请公布号 |
US2015279930(A1) |
申请公布日期 |
2015.10.01 |
申请号 |
US201414242366 |
申请日期 |
2014.04.01 |
申请人 |
Infineon Technologies AG |
发明人 |
Breymesser Alexander;Brockmeier Andre;Falck Elmar;Santos Rodriguez Francisco Javier;Schulze Holger |
分类号 |
H01L29/06;H01L29/861;H01L29/739;H01L29/40;H01L21/762 |
主分类号 |
H01L29/06 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device, comprising:
a semiconductor body with a first surface at a first side, a second surface opposite to the first surface and an edge surface connecting the first and second surfaces; an edge termination structure including a glass structure and extending along the edge surface at least from a plane coplanar with the first surface towards the second surface; and a conductive structure extending parallel to the first surface and overlapping the glass structure at the first side. |
地址 |
Neubiberg DE |