发明名称 |
SPUTTERING TARGET COMPRISING Ni-P ALLOY OR Ni-Pt-P ALLOY AND PRODUCTION METHOD THEREFOR |
摘要 |
Provided is a production method for a Ni-P alloy sputtering target, said production method being characterized in that: a Ni-P alloy that comprises 15-21 wt% of P and a remainder of Ni and unavoidable impurities is melted, the result is atomized in order to prepare a Ni-P alloy atomized powder having an average particle size of 100 µm or less, pure Ni atomized powder is subsequently mixed with the Ni-P alloy atomized powder, and the result is hot pressed. The present invention addresses the problem of providing a production method for a Ni-P alloy sputtering target in which deviation from a target composition is small. |
申请公布号 |
WO2015146604(A1) |
申请公布日期 |
2015.10.01 |
申请号 |
WO2015JP57265 |
申请日期 |
2015.03.12 |
申请人 |
JX NIPPON MINING & METALS CORPORATION |
发明人 |
OHASHI KAZUMASA;ODA KUNIHIRO |
分类号 |
C23C14/34;B22F1/00;B22F3/14;B22F3/15;B22F9/08;C22C19/03;G11B5/851 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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