发明名称 FORMING RESISTIVE RANDOM ACCESS MEMORIES TOGETHER WITH FUSE ARRAYS
摘要 A resistive random access memory array may be formed on the same substrate with a fuse array. The random access memory and the fuse array may use the same active material. For example, both the fuse array and the memory array may use a chalcogenide material as the active switching material. The main array may use a pattern of perpendicular sets of trench isolations and the fuse array may only use one set of parallel trench isolations. As a result, the fuse array may have a conductive line extending continuously between adjacent trench isolations. In some embodiments, this continuous line may reduce the resistance of the conductive path through the fuses.
申请公布号 US2015280123(A1) 申请公布日期 2015.10.01
申请号 US201514738453 申请日期 2015.06.12
申请人 Micron Technology, Inc. 发明人 Redaelli Andrea;Pirovano Agostino;Meotto Umberto Maria;Servalli Giorgio
分类号 H01L45/00;H01L27/24 主分类号 H01L45/00
代理机构 代理人
主权项 1. A method comprising: forming a chalcogenide memory array including forming select devices by forming two sets of orthogonal trenches, wherein said forming a chalcogenide memory array includes performing a process flow; and forming a fuse array on a same substrate as the chalcogenide memory array, wherein said forming the fuse array includes performing the process flow.
地址 Boise ID US