发明名称 SUBSTRATE PROCESSOR, STUDYING METHOD OF SUBSTRATE PROCESSING CONDITION, AND MEMORY MEDIUM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a substrate processor wherein the time for studying the processing conditions of substrates is not required. <P>SOLUTION: In the substrate processor 10, when studying its recipe in the course of subjecting wafers W of a lot to a RIE processing, EC89 of its system controller sets a recipe A as the recipe of the RIE processing whereto the wafers W of a lot are subjected, and the recipe buffering function of a first process unit 25 is negated (a step S801). Also, the RIE processing corresponding to the recipe A is executed to the wafers W (a step S803), and further, when the recipe A is not proper as the recipe of the RIE processing (NO at a step S805), the recipe A is modified in response to the modifying input of the recipe A. Moreover, the modified recipe A is developed in the first process unit 25 (a step S808), and furthermore, the RIE processing corresponding to the modified recipe A is executed to next wafers W (a step S811). <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007242868(A) 申请公布日期 2007.09.20
申请号 JP20060062882 申请日期 2006.03.08
申请人 TOKYO ELECTRON LTD 发明人 YOKOUCHI TAKESHI;YAGI FUMIKO
分类号 H01L21/3065 主分类号 H01L21/3065
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