METHOD FOR FORMING FILM OF METAL OXIDE ON SURFACE OF SUBSTRATE, AND NOZZLE OF AIR-OPEN-TYPE CVD APPARATUS USED IN THE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method for efficiently and inexpensively forming a dense and thick film of a metal oxide on the surfaces of various substrates with an air-open-type CVD method, and to provide a nozzle for a CVD apparatus used in the method. SOLUTION: This method for forming the film of the metal oxide on the surface of the substrate includes supplying oxygen into a mixture gas in the vicinity of an outlet of the nozzle for spraying the mixture gas, when spraying the mixture gas of a vaporized raw material of the film of the metal oxide and a carrier gas onto the surface of the heated substrate in atmospheric air to form the film of the metal oxide on the surface of the substrate. COPYRIGHT: (C)2007,JPO&INPIT