TOPORAPHICAL SELECTIVE PATTERNS

摘要

A MASKLESS PROCESS GENERATES A PATTERNED COATING ON A POLYMERIC SUBSTRATE, WHEREIN THE PATTERN IS AT LEAST PARTIALLY DEFINED BY THE SUBSTRATE TOPOGRAPHY. THE PROCESS USES A HIGH INTENSITY/HIGH FLUENCE ENERGY SOURCE TO STRIKE A COATED SUBSTRATE, THUS SELECTIVELY REMOVING A PORTION OF THE COATING. THE AMOUNT AND AREA OF THE COATING REMOVED IS DEPENDENT ON THE SUBSTRATE TOPOGRAPHY AND THE APPLIED ENERGY, AND THIS FORMS A PATTERN OF RESIDUAL COATING MATERIAL ON THE SUBSTRATE.