| 摘要 |
<p>A radiosensitive composition is provided to prevent defect and undercut in an end part of a pattern even under low exposure and a severe development condition and leave no undissolved material during development. A radiosensitive composition comprises (A) a colorant, (B) an alkali-soluble resin, (C) a multi-functional monomer, and (D) a photo-radical generator including at least one component selected from the group consisting of a compound represented by the formula(1) and a compound represented by the formula(2), and at least one component selected from the group consisting of biimidazole compounds, benzophenone compounds, thioxanthone compounds, and ketocoumarin compounds. The radiosensitive composition is used to form a coloring layer.</p> |
