发明名称 MANUFACTURE METHOD OF POROUS SILICON OXIDE POWDER
摘要 PROBLEM TO BE SOLVED: To provide a manufacture method of a porous silicon oxide powder that has high activity, excels in handling nature, and for this reason, that can be used for the application usefully. SOLUTION: The manufacture method of the porous silicon oxide powder comprises: heating a mixed raw material powder at least including a silicon dioxide powder at 1,100-1,600°C of a temperature range under inert gas or vacuum pressure; generating silicon oxide gas; and making the silicon oxide gas deposit on a cooled base body surface, wherein the temperature on the base body surface is 100-400°C, the concentration of the silicon oxide gas vapor is 0.5-15g/m<SP>3</SP>, the pore mean diameter is 0.5-20 nm, the pore volume is 0.005-0.2 cm<SP>3</SP>/g, and the BET specific surface area is 5-300 m<SP>2</SP>/g. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007099621(A) 申请公布日期 2007.04.19
申请号 JP20070009975 申请日期 2007.01.19
申请人 SHIN ETSU CHEM CO LTD 发明人 FUKUOKA HIROFUMI;ARAMATA MIKIO;UENO SUSUMU;MOMII KAZUMA;MIYAWAKI SATORU
分类号 C01B33/113 主分类号 C01B33/113
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