| 摘要 |
<p>A method (300) and system (1 , 2) for depositing a layer from a vaporized solid precursor. The method includes providing a substrate (25) in a process chamber (10, 11) of a deposition system (1 , 2), forming a precursor vapor by light- induced vaporization of a solid precursor (52), and exposing the substrate (25) to a process gas containing the precursor vapor to deposit a layer including at least one element from the precursor vapor on the substrate (25).</p> |
