发明名称 Fe-Co-BASED ALLOY TARGET MATERIAL AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a low permeability Fe-Co-based alloy target material having satisfactory sputtering properties, the target material being used for forming an amorphous or microcrystal soft magnetic film of an Fe-Co-based alloy for use in a perpendicular magnetic recording medium or the like. SOLUTION: The Fe-Co-based alloy target material is expressed by the compositional formula of ((Fe<SB>X</SB>Co<SB>(100-X)</SB>)<SB>100-Y</SB>M1<SB>Y</SB>) in atomic ratio; wherein, the element M1 is an element selected from the groups 4a, 5a and 4b; and 55≤X≤75, and 3≤Y≤25 are satisfied. Alternatively, the Fe-Co based alloy target material is expressed by the compositional formula of ((Fe<SB>X</SB>Co<SB>(100-X)</SB>)<SB>100-Z</SB>M2<SB>Z</SB>)<SB>100-Y</SB>M1<SB>Y</SB>in atomic ratio; wherein, the element M2 is one or more kinds of elements selected from the groups 6a, 7a and 8a (excluding Fe and Co); and 55≤X≤75, 3≤Y≤25, and 0<Z≤20 are satisfied. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006265653(A) 申请公布日期 2006.10.05
申请号 JP20050086852 申请日期 2005.03.24
申请人 HITACHI METALS LTD 发明人 UENO TOMONORI;TAKASHIMA HIROSHI;FUJIMOTO MITSUHARU
分类号 C23C14/34;B22F3/14;B22F3/15;C22C33/02;C22C38/00 主分类号 C23C14/34
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