发明名称 Self-compensating mark design for stepper alignment
摘要 A system and method for fabricating integrated circuits using four fine alignment targets per stepper shot. The four alignment targets are disposed within the scribe line on each side of a four-sided stepper shot. The targets on opposites sides of the region are located in mirror-image positions. For example, in a square or rectangular region, the targets could be at the mid-point of each side, or at each corner. Because the scribe lines for adjoining stepper shots overlap, a target in one shot will overlay a target from a preceding shot. In a positive resist process, for example, the target resulting from the overlay will be reduced in size by an amount corresponding to the amount of rotational error, if any. However, the target will still indicate the center of the stepper shot, thereby compensating for the rotational error with no further measurements.
申请公布号 US2006192302(A1) 申请公布日期 2006.08.31
申请号 US20060412596 申请日期 2006.04.26
申请人 LEROUX PIERRE 发明人 LEROUX PIERRE
分类号 G03F1/08;H01L23/544;G03F9/00;H01L21/027 主分类号 G03F1/08
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