| 摘要 |
PROBLEM TO BE SOLVED: To prevent liquid drained from a substrate surface from sticking again to a substrate in a development process, as much as possible. SOLUTION: When a substrate G, having a treated surface to which developing liquid has been fully supplied in a developing liquid supplying section 126, arrives at a specified position in a developing liquid draining section 128, a substrate tilting mechanism 180 installed therein is operated and lifts the substrate higher than the conveyance path 108 so that the substrate G faces a front with the side thereof adjacent to the developing liquid supplying section 126 that performs an upstream process becomes higher. With this tilted position, most of the developing liquid poured over the substrate G flows down toward the front of the substrate and is collected in a developing liquid pan 132. In this way, since the substrate G is tilted in such a way that the side thereof adjacent to the developing liquid supplying section 126 that performs an upstream process is raised higher, when the substrate G is tilted in the developing liquid draining section 128 in order to remove the liquid, it is possible to suppress the possibility that the liquid is splashed from the developing liquid pan 132 and sticks to the substrate G in the developing liquid supplying section 126. COPYRIGHT: (C)2006,JPO&NCIPI
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