| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a parallel light source device used for a projection device, a projection exposure device, a mask-less exposure device or the like, with high light utilization efficiency, high uniformity of an in-face intensity distribution, and a high degree of parallelism. <P>SOLUTION: The parallel light source device comprises lens arrays 10 composed of densely arranged positive lenses; a polarized-wave preservation type single-mode optical fiber 2 with a light irradiating end arranged at each focus of the positive lenses 1; and two optical fiber collimator arrays 11, 12 (13, 14) with deflection direction at their light-irradiating ends directed toward the same direction; while the polarized light is combined at an incident end of each polarized wave preservation type single-mode optical fiber 2. The polarization direction of a parallel light irradiated from the optical fiber collimator array 11 at one side and that irradiated from the optical fiber collimator array 12 at other side are selected so as to cross with each other at right angle, and it is constituted so that the both parallel lights are synthesized by a polarized light synthesizers 15 (16). <P>COPYRIGHT: (C)2006,JPO&NCIPI |
