| 摘要 |
PURPOSE:To improve the accuracy of a defect analysis by temporarily invalidating an inspection when the main and sub scanning positions of an image pattern to be compared with a reference pattern are moved to predetermined coordinates for comparing the two-dimensional scanning image pattern on the surface of a pellet marked with reference pattern at each scanning line thereby reducing the percentage of an inspection defying region to hold the size of the mark without reducing identifying power. CONSTITUTION:An inspection processor 8 sequentially compares an image pattern obtained from a pellet 101 to be inspected with a reference pattern to inspect the degree of discrepancy between both. When the degree of the discrepancy exceeds a predetermined allowable limit, an inspection output S1 is generated. A mask processor 9 controls whether the output S1 is output as an unacceptable inspection result or not in response to the signal S2 generated from an inspecting mask signal generator 10. The generator 10 generates a signal S2 for invalidating the inspection when the main and subs scanning positions of the two-dimensional scanning image pattern are moved to predetermined coordinates region.
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