Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas

摘要

An exposure method and apparatus simultaneously transfer patterns with various pitches with high-resolution. On the pupil surface of an illumination system, at least first and second pairs of areas are set. The distribution of intensity of light over the pupil surface is set so that the intensities of light of the second pair of areas is smaller than that of the first pair of areas.