发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a technique which can prevent an electric field concentration due to birds beaks and can suppress demerits of the birds beaks. SOLUTION: This invention relates to a semiconductor device having bit lines and word lines, characterized by comprising: a substrate in which there are provided plural first trenches extending in the bit-line direction and there are formed the birds beaks at upper edges of side surfaces constituting sidewalls of the first trenches; a first gate insulating film formed on the substrate between the first trenches; a floating gate formed on the first gate insulating film between the first trenches and located between second trenches extending in the word-line direction, wherein any birds beaks are not formed at lower edges of the side surfaces facing sides of the first trenches; a second gate insulating film formed on the floating gate between the second trenches; and a control gate formed on the second gate insulating film between the second trenches. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009164271(A) 申请公布日期 2009.07.23
申请号 JP20070340663 申请日期 2007.12.28
申请人 TOSHIBA CORP 发明人 KAWADA NOBUHITO;AKAHORI HIROSHI
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
代理机构 代理人
主权项
地址
您可能感兴趣的专利