| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a forming method for forming a reflection preventing structure excelling in reflection preventing function, in a large-area region at a low cost, and the reflection preventing structure by the method. <P>SOLUTION: The forming method for the reflection preventing structure comprises etching a base material layer together with particles using the particles arranged on the base material and harder to etch than the base material, as a mask and stopping etching work before the particles disappear. A ratio of etching speed of the base material to the particles is 1 to 5. The reflection preventing structure can also be formed by a nanoimprinting method using a stamper based on an original plate formed in the same way. <P>COPYRIGHT: (C)2009,JPO&INPIT |
