发明名称 SENDING WITH FLOWING METHOD AND ANALYSIS METHOD OF FINE PARTICLE, AND SUBSTRATE FOR ANALYZING FINE PARTICLE
摘要 PROBLEM TO BE SOLVED: To provide a flowing method of fine particles capable of achieving high analysis speed and analysis precision, to provide an analysis method using the sending with flowing method, and to provide a substrate for analyzing fine particles in an analysis system of fine particles using microchips. SOLUTION: The method for sending with flowing fine particles is provided, where fine particles are circulated through an arc-shaped peripheral curved channel 2 arranged on a substrate A, and the fine particles are separated in a centrifugal direction according to its specific gravity and flowed from the centrifugal force toward the outside from a curvature center Q of the peripheral curved channel 2. In the sending with flowing method, the fine particles are introduced into the peripheral curved channel 2 as a laminar flow deflected to the side of the curvature center Q, or as a laminar flow laminated in a vertical direction on a substrate surface. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009162643(A) 申请公布日期 2009.07.23
申请号 JP20080001161 申请日期 2008.01.08
申请人 SONY CORP 发明人 SHINODA MASATAKA;TSUBOI NAOTO
分类号 G01N35/08;G01N37/00 主分类号 G01N35/08
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