发明名称 Wafer surface observation apparatus
摘要 A dicing apparatus for moving a wafer quickly to a desired observation position before the wafer surface is observed. The apparatus comprises imaging means for imaging the surface of a wafer, display means for displaying the image picked up by the imaging means, input means for inputting position information by designating an arbitrary position displayed by the display means, by using the display position on the display means, conversion means for converting the inputted position information into positional information on the position of the wafer surface, and moving means for moving the display position on the basis of the converted positional information. The apparatus displays the image in the displayed position moved.
申请公布号 US7565002(B2) 申请公布日期 2009.07.21
申请号 US20040493865 申请日期 2004.12.20
申请人 TOKYO SEIMITSU CO., LTD. 发明人 YASUTOMI HIROYUKI;SAKUMA MIKIO;SHIMODA HIROFUMI
分类号 G06K9/00;H01L21/00;H01L21/68 主分类号 G06K9/00
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