| 摘要 |
A method for manufacturing a semiconductor device wherein both the threshold voltages of an N-type MISFET and a P-type MISFET are low, device can be easily manufactured at a lower cost and a higher product yield, and the reliability of the gate insulation film is higher. The gate insulation film is formed on the surface of a silicon substrate 1 in N-type MISFET forming region and the P-type MISFET forming region, and metal gates 4 and 5 are provided thereon. The metal gate 4 is made from a TiCoN film, and the work function thereof is set at 4.0 to 4.8 eV suited to the gate electrode material of the N-type MISFET. The metal gate 5 is formed from a portion of the TiCoN film by ion-implantation of oxygen into the TiCoN film configuring the gate electrode 4 at a dosage of 1013 to 1014 (ions/cm2) to raise the work function by around 0.2 to 0.8 eV.
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