| 摘要 |
A polyamic acid ester is provided to obtain a positive photosensitive resin composition capable of realizing high resolution by controlling the solubility of exposure area and unexposed area for alkali water. A polyamic acid ester has a structure of chemical formula 1. In chemical formula 1, R1 is a tetravalent group induced from dianhydride and R2 is a divalent organic group. In (X-Y-R3)m, X is selected from C1-C5 alkylene group, carbonyl group and thiocarbonyl group; Y is selected from NH, C1-C4 hydroxyalkylene and C0-C5 alkyl group; R3 is selected from an aryloxy group substituted with an aromatic group, cycloalkyloxy substituted with cycloaliphatic ring, alkyloxy group substituted with an C1-C5 alkyl group, hydroxycycloalkyl group substituted with an alicyclic ring, aryloxy group, cycloalkyloxy group and cycloalkyloxy group; n is an integer of 20~5000; m is value between 0.3~1.0; and if m is not greater than 1, (X-Y-R3) of the rate of (1-m) is H.
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