| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method by which a track width and the like can be optimally designed according to the shape of a recording head and the like. SOLUTION: The pattern forming method includes forming, on a substrate, a layer of a diblock copolymer composition containing PS and PEO, subjecting the layer to phase separation to obtain a phase-separated layer, thereby forming an easy-to-etch region constituted by PS and having a cylindrical or lamellar configuration extending in a first direction, forming an imprinting resist layer on the phase-separated layer, subjecting the imprinting resist layer to imprinting to form, on the imprinting resist layer, an uneven pattern consisting of projections and recesses extending in a second direction intersecting with the first direction, removing, from the imprinting resist layer, the recesses, thereby leaving only the projections and, at the same time, removing the PS from the diblock copolymer composition layer being the under layer of the recesses to obtain an etching resistive pattern containing PEO, and etching the substrate using, as a mask, not only the projections but also the etching resistive pattern. COPYRIGHT: (C)2009,JPO&INPIT
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