发明名称 PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an inspection device and method for suppressing an error of measurement data caused by variation of elements. <P>SOLUTION: The inspection device 100 comprises an XY&theta; table 102 for mounting a sample to be inspected, a line sensor 105 for imaging an optical image of the sample to be inspected by using a plurality of the light receiving elements, which are aligned in a second direction orthogonal to a first direction, and relatively move with respect to the XY&theta; table 102, an accumulation part 132 for accumulating respective pixel data, which is redundantly imaged by the line sensor 105 in a position shifted to the second direction by pixel unit, on each pixel, and a comparison part 139 for comparing the accumulated pixel data on each pixel and predetermined reference data. The pixel data imaged by the different light receiving elements are accumulated on each pixel, and thus variation of characteristics of the elements can be averaged. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009080064(A) 申请公布日期 2009.04.16
申请号 JP20070250651 申请日期 2007.09.27
申请人 NUFLARE TECHNOLOGY INC 发明人 ABE TAKAYUKI;TSUCHIYA HIDEO
分类号 G01N21/956;G01B11/24;G03F1/44;G03F1/84;G06T1/00;H01L21/027 主分类号 G01N21/956
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