发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF |
摘要 |
<p>A photosensitive resin composition and a photosensitive dry film which are excellent in both sensitivity and stability and are well-balanced in tent strength, resolution and plating non-staining are provided. The photosensitive resin composition comprises an alkali-soluble resin (A), a photopolymerizable compound (B) and a photopolymerization initiator (C), and the polymerization initiator (C) comprises a hexaarylbisimidazole based compound (C1) and a multifunctional thiol compound (C2) as essential components. The photosensitive dry film has at least a photosensitive resin layer formed from the photosensitive resin composition on a support film.</p> |
申请公布号 |
EP1825328(B1) |
申请公布日期 |
2009.04.15 |
申请号 |
EP20050811384 |
申请日期 |
2005.11.22 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
UEMATSU, TERUHIRO;KATSUMATA, NAOYA |
分类号 |
G03F7/031 |
主分类号 |
G03F7/031 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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