| 发明名称 |
Seal ring arrangements for immersion lithography systems |
| 摘要 |
Various seal ring arrangements for an immersion lithography system are disclosed. With the seal ring arrangements, the immersion lithography system can provide better sealing effect for processing the wafers on a wafer chuck.
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| 申请公布号 |
US7517639(B2) |
申请公布日期 |
2009.04.14 |
| 申请号 |
US20060522611 |
申请日期 |
2006.09.18 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
LIN BURN JENG;GAU TSAI-SHENG;CHEN CHUN-KUANG;LIU RU-GUN;YU SHINN SHENG;SHIH JEN CHIEH |
| 分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
| 代理机构 |
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