COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD, AND STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To prevent degradation of substrate conveying accuracy by restraining the conveying speed of a conveying mechanism conveying substrates between respective modules each carrying out processing of the substrates.

SOLUTION: Resist film forming conveyance means of a plurality of respective resist film formation blocks convey substrates between the modules carrying out various kinds of processing in the blocks independently of one another; a processing block carrying-in conveyance means sequentially and cyclically conveying the substrates to carrying-in exchange stage of each resist film formation block one by one; and an exposure device carrying-in conveyance means carries the substrates carried in a buffer module of each resist film formation block in an exposure device in the order in which the substrates are carried in the carrying-in exchange stage of the resist film formation block. The load of the resist film forming conveyance means is restrained relative to the case where a plurality of or multiple modules of the same type are installed in one resist film formation block in order to achieve equivalent throughput.

COPYRIGHT: (C)2009,JPO&INPIT