发明名称 |
Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method |
摘要 |
An immersion lithographic apparatus is described in which a liquid removal device (100) is arranged to remove liquid (11) from the substrate (W), e.g. during exposures, through a plurality of elongate slots (111) arranged along a line (D-D) and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.
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申请公布号 |
EP2249205(A1) |
申请公布日期 |
2010.11.10 |
申请号 |
EP20090159532 |
申请日期 |
2009.05.06 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
RIEPEN, MICHEL;KEMPER, NICOLAAS;VERMEULEN, JOHANNES;DIRECKS, DANIEL;PHILIPS, DANNY;VAN PUTTEN, ARNOLD |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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