发明名称 SURFACE PROCESSING METHOD
摘要 PURPOSE: A surface processing method is provided to eliminate all the fractured layers formed on the surface of the member including the fractured layer of a stepped part by reforming the member surface. CONSTITUTION: A focus ring(25) is configured by a ring-shaped member having a step(25a) on the inner side. The step is formed in response to the outer side of a wafer. An upper side(25d), a lower side(25e), and sides(25g, 25f) of the focus ring are formed by the mechanical polishing. A horizontal part(25b) and a corner(25c) of the step are polished manually.
申请公布号 KR20110005661(A) 申请公布日期 2011.01.18
申请号 KR20100066540 申请日期 2010.07.09
申请人 TOKYO ELECTRON LIMITED 发明人 SATOH NAOYUKI;NAGAYAMA NOBUYUKI;NAGAKUBO KEIICHI
分类号 H01L21/3065;H01L21/68 主分类号 H01L21/3065
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